Leading process simulation for the design and optimization of assets from early conceptual design through operations. Aspen HYSYS—bolstered by Industrial AI—helps companies maximize safety, sustainability and profits by optimizing the entire site in one environment using industry-validated simulation and time-saving workflows.

Rigorous process simulator that provides lifecycle modeling form design through operations, enhanced with Industrial AI. Model a wide range of chemical processes for both batch and continuous operations including solids, bioreactors, polymers and more. With integrated process modeling, improve time-to market, process efficiency and sustainability performance.

Combining first principle domain knowledge and machine learning techniques to enable rapid generation and calibration of process models using lab or plant data.

Enables rapid design and optimization of process layouts from conceptual project definition. Provides multiple layout options using AI, enabling teams to rapidly identify the most cost-effective arrangement. By automating layout design and balancing with capital costs, it helps engineering teams reduce design time, identify optimal designs and uncover opportunities for better investment decisions.

Predicts business performance of new and existing industrial systems, providing clear insights into the benefits, costs and risks associated with different operational or investment decisions meant to improve such performance. Combines Monte Carlo simulation with Flow Optimization to simulate planned and unplanned events, enabling leaders to assess expected outcomes and the impact of disruptive conditions.

Delivers fast, reliable capital cost estimates for engineering projects from conceptual design through front‑end engineering. Using a unique, model-based estimation approach and industry benchmarks, it enables teams to quickly compare project alternatives, scale the project up or down, assess uncertainty and make confident investment decisions early when cost leverage is highest.